The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2014
Filed:
Jul. 06, 2011
Satheesh Kuppurao, San Jose, CA (US);
Manish Hemkar, Sunnyvale, CA (US);
Vinh Tran, San Jose, CA (US);
Yihwan Kim, San Jose, CA (US);
Satheesh Kuppurao, San Jose, CA (US);
Manish Hemkar, Sunnyvale, CA (US);
Vinh Tran, San Jose, CA (US);
Yihwan Kim, San Jose, CA (US);
Applied Material, Inc., Santa Clara, CA (US);
Abstract
Embodiments of the present invention generally relate to methods for removing contaminants and native oxides from substrate surfaces. The methods generally include exposing a substrate having an oxide layer thereon to an oxidizing source. The oxidizing source oxidizes an upper portion of the substrate beneath the oxide layer to form an oxide layer having an increased thickness. The oxide layer with the increased thickness is then removed to expose a clean surface of the substrate. The removal of the oxide layer generally includes removal of contaminants present in and on the oxide layer, especially those contaminants present at the interface of the oxide layer and the substrate. An epitaxial layer may then be formed on the clean surface of the substrate.