Hamburg, Germany

Vincent Verneuil

This inventor holds 1 USPTO granted patent and 2 EPO patents. Top assignee: Nxp B.v.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Vincent Verneuil. Retrieved from https://idiyas.com/inventor/vincent-verneuil-fw09fd7f

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Vincent Verneuil: Innovator in Machine Learning Resilience

Introduction

Vincent Verneuil is a notable inventor based in Hamburg, Germany. He has made significant contributions to the field of machine learning, particularly in enhancing the resilience of models against adversarial examples. His innovative approach has garnered attention in the tech community.

Latest Patents

Vincent holds a patent for a "Method and data processing system for making machine learning model more resistant to adversarial examples." This patent describes a method where an input for a machine learning model is modified by adding a randomly generated mask. This mask helps negate the effects of perturbations that could turn the input into an adversarial example. The implementation of this method can significantly improve the robustness of machine learning systems.

Career Highlights

Throughout his career, Vincent has worked with prominent companies such as NXP B.V. and Inside Secure. His experience in these organizations has allowed him to develop and refine his skills in data processing and machine learning technologies.

Collaborations

Vincent has collaborated with talented individuals in his field, including Joppe Willem Bos and Simon Johann Friedberger. These partnerships have contributed to his innovative work and the advancement of machine learning methodologies.

Conclusion

Vincent Verneuil's contributions to machine learning demonstrate his commitment to innovation and resilience in technology. His patent and career achievements reflect his expertise and dedication to improving data processing systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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