The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2022
Filed:
Mar. 11, 2019
Nxp B.v., Eindhoven, NL;
Joppe Willem Bos, Wijgmaal, BE;
Simon Johann Friedberger, Heverlee, BE;
Christiaan Kuipers, Eindhoven, NL;
Vincent Verneuil, Hamburg, DE;
Nikita Veshchikov, Brussels, BE;
Christine Van Vredendaal, Eindhoven, NL;
Brian Ermans, 's-Hertogenbosch, NL;
NXP B.V., Eindhoven, NL;
Abstract
A method and data processing system for making a machine learning model more resistant to adversarial examples are provided. In the method, an input for a machine learning model is provided. A randomly generated mask is added to the input to produce a modified input. The modified input is provided to the machine learning model. The randomly generated mask negates the effect of a perturbation added to the input for causing the input to be an adversarial example. The method may be implemented using the data processing system.