This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Chartered Semiconductor Manufacturing Ltd (Corporation). Active years: 2003-2007.
Company Filing History:
Years Active: 2003-2007
Title: Innovations by Vincent Sih in Semiconductor Technology
Introduction
Vincent Sih is a notable inventor based in Singapore, recognized for his contributions to semiconductor technology. He holds two patents that focus on improving the fabrication processes of semiconductor devices. His work addresses critical challenges in the industry, particularly concerning the elimination of defects that can compromise device performance.
Latest Patents
Vincent Sih's latest patents include methods for the elimination of arsenic-based defects in semiconductor devices with isolation regions. This invention outlines procedures for preparing conductive regions, such as source and drain regions, for silicidation. The methods involve the removal of native oxide and arsenic-based defects from conductive surfaces before the deposition of metal components for metal silicide regions. Additionally, his patent describes a hydrofluoric acid cycle that aids in releasing arsenic from shallow trench isolation regions, preventing re-deposition on the source and drain regions.
Another significant patent by Sih is a method for selective oxide etching in pre-metal deposition. This method allows for the complete removal of dielectric layers formed on substrates used in microelectronics fabrication. It enhances the properties of closely spaced structures, such as self-aligned metal silicide electrical contacts, while minimizing degradation. The process includes the formation of a salicide block layer and employs dry plasma reactive ion etching to achieve precise results.
Career Highlights
Vincent Sih has made substantial contributions to the field of semiconductor manufacturing through his innovative approaches. He is currently associated with Chartered Semiconductor Manufacturing Ltd, where he continues to advance semiconductor technology. His expertise in the field has positioned him as a key figure in addressing the complexities of microelectronics fabrication.
Collaborations
Vincent has collaborated with notable colleagues, including Simon Yew-Meng Chooi and Zainab Ismail. Their combined efforts have contributed to the development of advanced semiconductor technologies and processes.
Conclusion
Vincent Sih's work in semiconductor technology exemplifies the importance of innovation in addressing industry challenges. His patents reflect a commitment to enhancing the efficiency and reliability of semiconductor devices. Through his contributions, Sih continues to influence the future of microelectronics fabrication.