Portland, OR, United States of America

Vincent R Caillouette

This inventor holds 1 USPTO granted patent. Top assignee: Intel Corporation. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Vincent R Caillouette. Retrieved from https://idiyas.com/inventor/vincent-r-caillouette

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Innovations by Vincent R. Caillouette

Introduction

Vincent R. Caillouette is a notable inventor based in Portland, Oregon, renowned for his contributions to the field of semiconductor technology. His innovative work at Intel Corporation has resulted in the development of a unique patent that enhances the efficiency of metal deposition processes in semiconductor manufacturing.

Latest Patents

Vincent Caillouette holds a patent for an "Apparatus and method for electroless spray deposition." This invention pertains to a novel apparatus designed for the electroless spray deposition of a metal layer onto a substrate, such as applying a cobalt shunt or barrier layer on a copper layer of a semiconductor wafer. The apparatus includes a processing chamber that accommodates the substrate, featuring a mechanism to seal the chamber for pressurization purposes. Essential components of the invention include an inlet for pressurizing gas, an exhaust line, a pressure regulator, and a sprayer for the electroless plating solution.

Career Highlights

Throughout his career, Vincent Caillouette has played a pivotal role in advancing semiconductor fabrication technologies. His work at Intel Corporation exemplifies his commitment to innovation, particularly in processes that enhance the efficiency and quality of semiconductor devices. His singular patent reflects a significant step forward in manufacturing techniques, contributing to the reliability and performance of electronic components.

Collaborations

Vincent collaborates with talented professionals in his field, including colleagues Valery M. Dubin and Christopher D. Thomas. These partnerships reinforce the importance of teamwork in driving technological advancements and the development of innovative solutions in semiconductor processing.

Conclusion

Vincent R. Caillouette's contributions to the field of electroless spray deposition underline the critical role inventors play in shaping modern technology. His patent not only showcases his technical expertise but also reflects the collaborative spirit of innovation at Intel Corporation. As technology continues to evolve, the impact of inventors like Caillouette remains vital for the advancement of the semiconductor industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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