This inventor holds 1 USPTO granted patent. Top assignees: Safran Aircraft Engines, Safran Electronics & Defense, Safran Landing Systems. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:




Years Active: 2026
Title: Vincent Hupin: Innovator in Aircraft Landing Systems
Introduction
Vincent Hupin is a notable inventor based in Moissy Cramayel, France. He has made significant contributions to the field of aviation, particularly in the area of aircraft landing systems. His innovative approach has led to the development of a patented method that enhances runway safety and efficiency.
Latest Patents
Vincent Hupin holds a patent for a "Method and system for determining aircraft landing runway conditions." This method involves acquiring a set of data groups of different types for evaluating and monitoring runway degradation conditions. The process includes deriving weighting coefficients from each data group, filtering the data, determining partial runway conditions, modifying the weighting coefficients, and ultimately combining these conditions to derive a runway condition coefficient associated with a confidence index.
Career Highlights
Throughout his career, Vincent has worked with prominent companies in the aerospace sector, including Safran Aircraft Engines and Safran Electronics & Defense. His experience in these organizations has allowed him to apply his innovative ideas in practical settings, contributing to advancements in aircraft technology.
Collaborations
Vincent has collaborated with various professionals in his field, including his coworker Laurent Miralles. Their joint efforts have furthered the development of technologies that enhance aviation safety and performance.
Conclusion
Vincent Hupin's contributions to aircraft landing systems through his innovative patent demonstrate his commitment to improving aviation safety. His work continues to influence the industry and pave the way for future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile