This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 1992.
Company Filing History:
Years Active: 1992
Title: Vincent DiMilia: Innovator in X-ray Lithography
Introduction
Vincent DiMilia is a notable inventor based in Carmel, NY (US). He has made significant contributions to the field of X-ray lithography, particularly with his innovative patent that enhances the capabilities of X-ray mask structures.
Latest Patents
Vincent DiMilia holds a patent for a "Variable magnification mask for X-ray lithography." This invention features an X-ray mask structure that can be adjusted by applied force to provide variable magnification of a pattern on the mask membrane. The applied force is generated by the heat expansion of a deformable member, which creates stress on a support ring. The design includes a circular patterned mask membrane supported by a ring made of materials such as silicon or silicon-pyrex. A concentric aluminum ring with an embedded circular heating element is integrated into the support ring. The heating element causes the aluminum ring to expand, resulting in mechanical stress that expands the mask membrane. This expansion leads to a corresponding magnification of the pattern on the mask.
Career Highlights
Vincent DiMilia has had a distinguished career, working at the International Business Machines Corporation (IBM). His work has focused on advancing technologies in the field of lithography, which is crucial for the manufacturing of microelectronics.
Collaborations
Vincent has collaborated with John M Warlaumont, a fellow innovator in the field. Their partnership has contributed to the development of advanced technologies in X-ray lithography.
Conclusion
Vincent DiMilia's contributions to X-ray lithography through his innovative patent demonstrate his expertise and commitment to advancing technology in this critical field. His work continues to influence the industry and pave the way for future innovations.