The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 1992
Filed:
Mar. 28, 1991
Vincent DiMilia, Carmel, NY (US);
John M Warlaumont, Chappaqua, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
An X-ray mask structure for X-ray lithography which can be adjusted by applied force to provide variable magnification of a pattern on the mask membrane. The applied force is provided by the heat expansion of a deformable member and the resultant stress on a support ring. A circular patterned mask membrane is supported in a ring composed, for example, of silicon or silicon-pyrex. The support ring contains a concentric aluminum ring having an embedded circular heating element. The heating element causes expansion of the aluminum ring which causes mechanical stress in the support and expansion of the mask membrane. Expansion of the mask membrane results in a corresponding magnification of the pattern thereon.