This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 1983.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1983
Title: Vincent D Gravdahl: Innovator in Thin Film Techniques
Introduction
Vincent D Gravdahl is a notable inventor based in Rochester, MN (US). He has made significant contributions to the field of thin film techniques, particularly in the fabrication of narrow track ferrite heads. His innovative approach has led to advancements in the production processes used in various technologies.
Latest Patents
Vincent D Gravdahl holds a patent for "Thin film techniques for fabricating narrow track ferrite heads." This patent describes a process for producing a reactive ion-etched structure with height and width dimensions of the order of 25 microns or less on a ferrite substrate surface. The method involves forming a mask of positive water-saturated photoresist on the substrate, plating a metal from a group consisting of nickel and a nickel-iron alloy through the mask, and then removing the photoresist mask to leave a pattern in the plated metal. The exposed ferrite substrate surface is reactive ion etched with a power density of >1w/cm² and a bias voltage of <-100 volts.
Career Highlights
Throughout his career, Vincent D Gravdahl has demonstrated a commitment to innovation and excellence in his field. His work has not only contributed to the advancement of technology but has also paved the way for future developments in thin film applications.
Collaborations
Vincent has collaborated with notable colleagues such as Patrick M McCaffrey and Bruce W Wright. These partnerships have further enhanced his research and development efforts, leading to impactful innovations.
Conclusion
Vincent D Gravdahl is a distinguished inventor whose work in thin film techniques has made a significant impact on technology. His patent and collaborations reflect his dedication to advancing the field and contributing to future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile