The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 1983
Filed:
Mar. 15, 1982
Nathaniel C Anderson, Pine Island, MN (US);
Larry E Daby, Rochester, MN (US);
Vincent D Gravdahl, Rochester, MN (US);
Patrick M McCaffrey, Rochester, MN (US);
Bruce A Murray, Rochester, MN (US);
Bruce W Wright, Oronoco, MN (US);
Other;
Abstract
A process for producing a reactive ion-etched structure with height and width dimensions of the order of 25 microns or less on a ferrite substrate surface is disclosed. A mask of positive water saturated photoresist is formed on the substrate. A metal taken from the group consisting of nickel and a nickel-iron alloy is plated through the mask. The photoresist mask is removed to leave a pattern in the plated metal. The ferrite substrate surface that is exposed by the pattern is reactive ion etched with a power density of >1w/cm.sup.2 and a bias voltage <-100 volts.