Bengaluru, India

Vinay Konana Basavaraj

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Vinay Konana Basavaraj. Retrieved from https://idiyas.com/inventor/vinay-konana-basavaraj

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Vinay Konana Basavaraj: Innovator in Atomic Layer Deposition Technology

Introduction

Vinay Konana Basavaraj is a notable inventor based in Bengaluru, India. He has made significant contributions to the field of atomic layer deposition technology. His innovative work has led to the development of a unique part coating reactor that enhances manufacturing processes.

Latest Patents

Vinay holds 1 patent for his invention titled "Atomic Layer Deposition Part Coating Chamber." This patent describes embodiments of part coating reactors, which include a lid assembly with a body featuring a central region and a peripheral region. The design incorporates a central opening, multiple annular heater grooves, and vertical slots that enhance the functionality of the reactor.

Career Highlights

Vinay is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work focuses on advancing technologies that improve manufacturing efficiency and product quality. His expertise in atomic layer deposition has positioned him as a key player in the industry.

Collaborations

Throughout his career, Vinay has collaborated with talented professionals, including Manojkumar Shanmugasundaram and Sriharsha Dharmapura Sathyanarayanamurthy. These collaborations have fostered innovation and contributed to the success of various projects.

Conclusion

Vinay Konana Basavaraj is a distinguished inventor whose work in atomic layer deposition technology has made a significant impact in the field. His contributions continue to drive advancements in manufacturing processes, showcasing the importance of innovation in today's technological landscape.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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