Company Filing History:
Years Active: 2008
Title: Victor P Bashurin: Innovator in Photolithography Mask Technology
Introduction
Victor P Bashurin is a notable inventor based in Sarov, Russia. He has made significant contributions to the field of photolithography, particularly in the modification of pixelated photolithography masks. His innovative approach aims to enhance the efficiency and effectiveness of photolithography processes.
Latest Patents
Victor P Bashurin holds a patent for the "Modification of pixelated photolithography masks based on electric fields." This invention describes a faster synthesis of photolithography mask modifications. In one embodiment, the invention includes synthesizing a first binary photolithography mask, developing perturbations to an estimated electric field generated by the first mask in use, and synthesizing a second binary photolithography mask by applying the perturbations to the first mask. This advancement has the potential to streamline photolithography processes significantly.
Career Highlights
Victor is currently employed at Intel Corporation, where he continues to work on innovative technologies that push the boundaries of photolithography. His expertise in this area has made him a valuable asset to the company and the industry as a whole.
Collaborations
Victor has collaborated with notable colleagues, including Bin Hu and Vivek K Singh. These partnerships have fostered an environment of innovation and creativity, leading to advancements in their respective fields.
Conclusion
Victor P Bashurin is a distinguished inventor whose work in photolithography mask technology exemplifies innovation and progress. His contributions are paving the way for more efficient manufacturing processes in the semiconductor industry.