Portland, OR, United States of America

Victor K Souw

This inventor holds 1 USPTO granted patent. Top assignee: Intel Corporation. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Victor K Souw. Retrieved from https://idiyas.com/inventor/victor-k-souw

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: Victor K. Souw: Innovator in Chemical-Mechanical Polishing Technology

Introduction

Victor K. Souw is a notable inventor based in Portland, OR (US). He has made significant contributions to the field of chemical-mechanical polishing (CMP) technology. His innovative approach has led to the development of a unique patent that enhances the efficiency of CMP processes.

Latest Patents

Victor K. Souw holds a patent for a "Conditioning polishing pad for chemical-mechanical polishing." This invention involves a method of conditioning a CMP pad by cycling it between two temperatures. This process effectively eliminates crystalline areas in the CMP pad, improving its performance and longevity. He has 1 patent to his name.

Career Highlights

Victor is currently employed at Intel Corporation, where he applies his expertise in CMP technology. His work at Intel has positioned him as a key player in advancing semiconductor manufacturing processes. His innovative solutions have contributed to the efficiency and effectiveness of the company's operations.

Collaborations

Victor has collaborated with talented individuals such as Alexander Tregub and Mansour Moinpour. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Victor K. Souw is a distinguished inventor whose work in chemical-mechanical polishing technology has made a significant impact in the industry. His contributions continue to influence advancements in semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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