This inventor holds 2 USPTO granted patents and 2 published patent applications and 2 EPO patents. Top assignees: Imec Vzw, Katholieke Universiteit Leuven. Active years: 2020.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:


Years Active: 2020
Title: Vicky Philipsen: Innovator in Extreme Ultraviolet Technology
Introduction
Vicky Philipsen is a notable inventor based in Tervuren, Belgium. She has made significant contributions to the field of extreme ultraviolet technology, holding 2 patents that showcase her innovative approach to lithography and materials science.
Latest Patents
Her latest patents include advancements in reticles for lithography. One patent describes a method for making a reticle that involves providing an assembly with an extreme ultraviolet mirror and a cavity overlaying at least a bottom part of the mirror. The method also includes partially filling the cavity with an extreme ultraviolet absorbing structure made from a metallic material that includes elements such as Ni, Co, Sb, Ag, In, and Sn. Another patent focuses on extreme ultraviolet absorbing alloys, detailing an alloy that comprises first elements from a specific list and second elements from another list, with defined atomic ratios to optimize performance.
Career Highlights
Vicky has worked with prominent organizations such as Imec Vzw and Katholieke Universiteit Leuven. Her experience in these institutions has allowed her to develop her expertise in advanced materials and lithography techniques.
Collaborations
Throughout her career, Vicky has collaborated with talented individuals, including Kim Vu Luong and Boon Teik Chan. These partnerships have contributed to her innovative work and the advancement of technology in her field.
Conclusion
Vicky Philipsen stands out as a pioneering inventor in extreme ultraviolet technology, with her patents reflecting her commitment to innovation and excellence. Her contributions continue to influence the industry and inspire future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile