The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2020

Filed:

Sep. 06, 2018
Applicants:

Imec Vzw, Leuven, BE;

Katholieke Universiteit Leuven, Ku Leuven R&d, Leuven, BE;

Inventors:

Boon Teik Chan, Leuven, BE;

Kim Vu Luong, Leuven, BE;

Vicky Philipsen, Tervuren, BE;

Efrain Altamirano Sanchez, Kessel-Lo, BE;

Kevin Vandersmissen, Tervuren, BE;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/24 (2012.01); G03F 1/22 (2012.01); G03F 1/52 (2012.01); G03F 1/54 (2012.01); G03F 1/48 (2012.01); G03F 1/80 (2012.01); G03F 7/20 (2006.01); H01L 21/768 (2006.01); G03F 1/58 (2012.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
G03F 1/24 (2013.01); G03F 1/22 (2013.01); G03F 1/48 (2013.01); G03F 1/52 (2013.01); G03F 1/54 (2013.01); G03F 1/58 (2013.01); G03F 1/80 (2013.01); G03F 7/2002 (2013.01); H01L 21/76879 (2013.01); B82Y 40/00 (2013.01); G21K 2201/061 (2013.01);
Abstract

An example method for making a reticle includes providing an assembly. The assembly includes an extreme ultraviolet mirror and a cavity overlaying at least a bottom part of the extreme ultraviolet mirror. The method also includes at least partially filling the cavity with an extreme ultraviolet absorbing structure that includes a metallic material that includes an element selected from Ni, Co, Sb, Ag, In, and Sn, by forming the extreme ultraviolet absorbing structure selectively in the cavity.


Find Patent Forward Citations

Loading…