Kim Vu Luong

Title: Kim Vu Luong: Advancing Extreme Ultraviolet Lithography Materials.

Introduction

Kim Vu Luong is an inventor based in Leuven, Belgium, whose patent work focuses on materials and structures for extreme ultraviolet (EUV) lithography. His two patents address reticle fabrication and EUV-absorbing alloys.

Latest Patents

**Reticles for Lithography.** This invention describes a method for making a reticle by providing an assembly containing an EUV mirror and an overlying cavity. The cavity is at least partially filled with an EUV-absorbing structure formed selectively within it. The structure includes a metallic material containing at least one of nickel, cobalt, antimony, silver, indium, or tin.

**Extreme Ultraviolet Absorbing Alloys.** This invention concerns alloys designed to absorb EUV radiation. The alloys combine selected elements from groups that include silver, nickel, cobalt, iron, ruthenium, rhodium, palladium, osmium, iridium, platinum, antimony, and tellurium. The patent specifies different atomic-ratio ranges depending on the elements used.

Together, these 2 patents reflect work on EUV materials and components relevant to lithography.

Career Highlights

Luong’s listed professional affiliations include Katholieke Universiteit Leuven and Imec Vzw. His patent topics connect materials research with the practical requirements of lithographic reticles and EUV absorption.

Collaborations

His listed coworkers include Vicky Philipsen and Kevin Vandersmissen. Their shared professional context includes work associated with Leuven’s research and technology ecosystem.

Conclusion

Kim Vu Luong’s patent portfolio focuses on EUV lithography, spanning reticle fabrication and absorbing-alloy compositions.