Company Filing History:
Years Active: 2007
Title: Venson Lee - Innovator in Lithography Technology
Introduction
Venson Lee is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of lithography, particularly in methods that enhance the precision of pattern formation in photoresist layers. His innovative approach has implications for various applications in semiconductor manufacturing.
Latest Patents
Venson Lee holds a patent for a lithography method that focuses on forming a plurality of patterns in a photoresist layer. This method involves a phase shift mask that includes a variety of transparent main features, first phase shift transparent regions, and second phase shift transparent regions. Each transparent main feature is surrounded by these phase shift regions, which are interlaced contiguously along the periphery. The unique phase shifts between the first and second regions allow for an effective exposure process, enabling the formation of intricate patterns in the photoresist layer.
Career Highlights
Venson Lee is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work there has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in lithography technology.
Collaborations
Throughout his career, Venson has collaborated with talented individuals such as Chin-Lung Lin and Chuen Huei Yang. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.
Conclusion
Venson Lee's contributions to lithography methods exemplify the importance of innovation in the semiconductor industry. His work continues to influence the field, paving the way for future advancements in technology.