Company Filing History:
Years Active: 2014-2015
Title: Valli Arunachalam: Innovator in Integrated Circuit Technology
Introduction
Valli Arunachalam is a prominent inventor based in Pleasant Valley, NY (US), known for her significant contributions to the field of integrated circuits. With a total of three patents to her name, she has made remarkable advancements in semiconductor technology.
Latest Patents
Her latest patents include innovative methods for fabricating integrated circuits. One patent focuses on integrated circuits and methods for fabricating integrated circuits with silicide contacts on non-planar structures. This method involves providing a semiconductor substrate and forming fins over it, with each fin having sidewalls. A metal film stack is conformally deposited on the sidewalls, which is then annealed to create a metal silicide film. Another patent details methods for fabricating integrated circuits with low resistance metal gate structures. This process includes forming a metal gate stack in a FET trench, etching it to create a recessed structure, and depositing a copper layer to fill the inner cavity.
Career Highlights
Valli Arunachalam has established herself as a key figure in her field through her innovative work at Globalfoundries Inc. Her expertise in integrated circuit technology has positioned her as a valuable asset in the semiconductor industry.
Collaborations
Throughout her career, she has collaborated with notable colleagues, including Paul Raymond Besser and Sean Xuan Lin, contributing to various projects that advance integrated circuit technology.
Conclusion
Valli Arunachalam's contributions to integrated circuit technology through her patents and work at Globalfoundries Inc. highlight her role as a leading innovator in the semiconductor industry. Her advancements continue to influence the future of integrated circuits.