Valerie A Bach

Title: Valerie A Bach: Innovator in Semiconductor Technology

Introduction

Valerie A Bach is a prominent inventor based in Philomath, Oregon. She has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. Her work focuses on improving the quality and efficiency of semiconductor devices.

Latest Patents

Valerie's latest patents include a process for semiconductor device etch damage reduction using a multi-layer structure. This innovative process addresses the existing needs in the industry by enhancing the post-etch treatment of damaged semiconductor devices. By exposing the damaged silicon to a forming-gas downstream plasma, her method results in substantially increased oxide regrowth and significantly higher gate oxide quality.

Another notable patent involves a single chamber via etch through a dual-layer dielectric. This method allows for the formation of tapered via holes of uniform diameter in a dual-layer dielectric used for isolation in integrated circuits. The process includes forming a photoresist layer, patterning it to define a via hole, and successively plasma etching the nitride and oxide layers to create via holes that connect to underlying metal lines.

Career Highlights

Throughout her career, Valerie has worked with notable companies, including Hewlett-Packard Company and Hewlett-Packard Corporation. Her experience in these organizations has contributed to her expertise in semiconductor technology and innovation.

Collaborations

Valerie has collaborated with various professionals in her field, including her coworker Kenneth D Saul. Their joint efforts have further advanced the development of semiconductor technologies.

Conclusion

Valerie A Bach is a distinguished inventor whose work in semiconductor technology has led to significant advancements in the industry. Her innovative patents and career achievements highlight her contributions to improving semiconductor device quality and efficiency.