Limours en Hurepoix, France

Valerick Cassagne

USPTO Granted Patents = 1 

 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Valerick Cassagne: Innovator in Thin Film Deposition Technology

Introduction

Valerick Cassagne is a notable inventor based in Limours en Hurepoix, France. He has made significant contributions to the field of material science, particularly in the area of thin film deposition technology. His innovative work has led to the development of a unique apparatus that enhances the efficiency of material application on substrates.

Latest Patents

Valerick Cassagne holds a patent for an "Apparatus for depositing a thin film of material on a substrate and regeneration process for such an apparatus." This invention discloses a sophisticated apparatus that includes a chamber, a cryogenic panel, a sample holder, and a gas injector. The design features a first trap connected to the vacuum chamber, which is capable of trapping a portion of the gaseous precursor released by the cryogenic panel. Additionally, the apparatus incorporates a second trap with a variable pumping capacity that can be regulated based on the gaseous precursor's partial pressure. This innovative design ensures that the total pumping capacity is sufficient to maintain the desired pressure within the vacuum chamber.

Career Highlights

Valerick Cassagne's career is marked by his dedication to advancing thin film deposition technologies. His work at Riber, a company known for its expertise in molecular beam epitaxy and other advanced deposition techniques, has allowed him to collaborate with leading professionals in the field. His patent reflects his commitment to innovation and the pursuit of excellence in material application processes.

Collaborations

Valerick has worked alongside talented colleagues such as Jerome Villette and Catherine Chaix. Their collaborative efforts have contributed to the development of cutting-edge technologies in the field of thin film deposition.

Conclusion

Valerick Cassagne's contributions to the field of thin film deposition technology exemplify his innovative spirit and dedication to advancing material science. His patent and work at Riber highlight the importance of collaboration and innovation in driving technological progress.

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