Riber

Valerick Cassagne

Jerome Villette

Catherine Chaix

Michel Picault

Jerôme Villette

Jérome Villette

Disclosed is an apparatus for depositing a thin film of material on a substrate and a regeneration process. The apparatus includes a chamber, a cryogenic panel disposed inside the chamber, a sample holder able to support a substrate, a gas injector able to inject a gaseous precursor into the chamber, a first trap connected to the vacuum chamber and able to trap a part of the gaseous precursor released by the cryogenic panel, the first trap having a fixed pumping capacity S. The apparatus for depositing a thin film of material on a substrate includes a second trap having a variable pumping capacity Sable to be regulated in function of the gaseous precursor partial pressure, the first and second trap providing a total pumping capacity S=S+Ssufficient to maintain the gaseous precursor partial pressure in the vacuum chamber under a determined pressure P.

Growing community of inventors

Limours en Hurepoix, France

Valerick Cassagne