The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2014
Filed:
Jun. 17, 2010
Jerome Villette, Le Plessis Robinson, FR;
Valerick Cassagne, Limours en Hurepoix, FR;
Catherine Chaix, Saint-Cloud, FR;
Jerome Villette, Le Plessis Robinson, FR;
Valerick Cassagne, Limours en Hurepoix, FR;
Catherine Chaix, Saint-Cloud, FR;
Riber, Bezons, FR;
Abstract
Disclosed is an apparatus for depositing a thin film of material on a substrate and a regeneration process. The apparatus includes a chamber, a cryogenic panel disposed inside the chamber, a sample holder able to support a substrate, a gas injector able to inject a gaseous precursor into the chamber, a first trap connected to the vacuum chamber and able to trap a part of the gaseous precursor released by the cryogenic panel, the first trap having a fixed pumping capacity S. The apparatus for depositing a thin film of material on a substrate includes a second trap having a variable pumping capacity Sable to be regulated in function of the gaseous precursor partial pressure, the first and second trap providing a total pumping capacity S=S+Ssufficient to maintain the gaseous precursor partial pressure in the vacuum chamber under a determined pressure P.