This inventor holds 1 USPTO granted patent. Top assignee: Rohm and Haas Electronics Materials LLC. Active years: 2011.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2011
Title: Inventor Spotlight: Vaishali Raghu Vohra
Introduction
Vaishali Raghu Vohra is a notable inventor based in South Grafton, Massachusetts, who has made significant contributions to the field of electronics materials. With expertise in developing advanced coating compositions, she has secured a patent that enhances the performance of photoresist compositions used in lithography.
Latest Patents
Vaishali holds one patent titled "Coating compositions for use with an overcoated photoresist." This innovation involves underlying coating compositions that improve the overall efficiency and functionality of photoresists. Her patent details coatings that can be crosslinked and contain either acid-labile groups or base-reactive groups, which become reactive post-crosslinking. These enhancements allow for a modulated water contact angle and improved etch rates in plasma etchants, ultimately elevating the lithographic performance of associated photoresist compositions.
Career Highlights
Vaishali is currently affiliated with Rohm and Haas Electronics Materials LLC, where she applies her knowledge and creativity to the development of innovative materials for the electronics sector. Her contribution to the field has not only advanced product capabilities but also exemplified the role of women in STEM.
Collaborations
Throughout her career, Vaishali has collaborated with several notable professionals, including her coworkers James W. Thackeray and Gerald B. Wayton. These partnerships have fostered an environment of innovation, enabling the sharing of ideas and expertise in pursuit of technological advancements.
Conclusion
Vaishali Raghu Vohra's innovative work in the field of coating compositions significantly impacts the electronics materials industry. Her patent demonstrates her commitment to enhancing the functionality of photoresists, positioning her as an influential figure among inventors in her field. As she continues to develop and refine her ideas, the industry eagerly anticipates her future contributions.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile