V Wade Singleton

Title: V Wade Singleton: Innovator in Non-Destructive Metrology

Introduction

V Wade Singleton is a notable inventor based in Gilbert, AZ (US). He has made significant contributions to the field of metrology, particularly in the area of semiconductor thickness measurements. His innovative work has led to the development of advanced measurement systems that enhance the accuracy and efficiency of semiconductor manufacturing processes.

Latest Patents

Singleton holds a patent for a system titled "Non-destructive gap metrology." This patent describes a metrology system equipped with 3-dimensional sensors designed for thickness measurements of semiconductor elements. The system utilizes a single or dual 3-dimensional profiler that scans both the top and bottom surfaces of an element to obtain precise thickness measurements. Additionally, the method can measure gaps between assembled elements, showcasing its versatility and importance in the semiconductor industry.

Career Highlights

V Wade Singleton is currently employed at Intel Corporation, where he continues to push the boundaries of innovation in semiconductor technology. His work at Intel has allowed him to collaborate with some of the brightest minds in the industry, contributing to advancements that have a lasting impact on technology.

Collaborations

Some of Singleton's notable coworkers include Jianyong Mo and Yiren Wu. Their collaborative efforts have further enhanced the research and development initiatives at Intel Corporation, fostering an environment of innovation and creativity.

Conclusion

V Wade Singleton's contributions to non-destructive metrology represent a significant advancement in semiconductor technology. His innovative patent and ongoing work at Intel Corporation highlight his commitment to improving measurement systems in the industry.