Neustadt, Germany

Uwe Winkler

This inventor holds 1 USPTO granted patent. Top assignee: Infineon Technologies Ag. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Uwe Winkler. Retrieved from https://idiyas.com/inventor/uwe-winkler-2q6wtav7

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Uwe Winkler: Innovator in Exposure Technology

Introduction

Uwe Winkler is a notable inventor based in Neustadt, Germany. He has made significant contributions to the field of exposure technology, particularly in the development of exposure masks and apparatuses. His innovative work has led to advancements that are crucial in various applications.

Latest Patents

Uwe Winkler holds a patent for an "Exposure mask, exposure apparatus and method for calibrating an exposure apparatus." This invention includes various embodiments of an exposure mask that may consist of a carrier, a first exposure structure in a first structure plane of the carrier, and a second exposure structure in a second structure plane of the carrier. The two structure planes differ from one another, showcasing the complexity and ingenuity of his design.

Career Highlights

Winkler is associated with Infineon Technologies AG, a leading company in semiconductor solutions. His work at Infineon has allowed him to be at the forefront of technological advancements in the industry. With a total of 1 patent, he has demonstrated his capability to innovate and contribute to the field.

Collaborations

Throughout his career, Uwe Winkler has collaborated with talented individuals such as Heiko Assmann and Markus Dankelmann. These collaborations have fostered an environment of creativity and innovation, leading to the development of cutting-edge technologies.

Conclusion

Uwe Winkler's contributions to exposure technology exemplify the impact of innovation in the semiconductor industry. His work continues to influence advancements in technology, making him a significant figure in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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