The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 25, 2019

Filed:

May. 16, 2017
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventors:

Heiko Assmann, Dresden, DE;

Markus Dankelmann, Wachau, DE;

Uwe Winkler, Neustadt, DE;

Assignee:

INFINEON TECHNOLOGIES AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/54 (2006.01); G03F 7/20 (2006.01); G03F 1/22 (2012.01); G03F 1/44 (2012.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70058 (2013.01); G03F 1/22 (2013.01); G03F 1/44 (2013.01); G03F 7/70641 (2013.01); G03F 7/70683 (2013.01); G03F 9/7026 (2013.01);
Abstract

In various embodiments, an exposure mask may include a carrier, a first exposure structure in a first structure plane of the carrier, and a second exposure structure in a second structure plane of the carrier. The two structure planes differ from one another.


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