Uwe Wielsch

Title: Uwe Wielsch: Innovator in Spectroscopic Ellipsometry

Introduction

Uwe Wielsch is a notable inventor based in Berlin, Germany. He has made significant contributions to the field of optical measurement technology, particularly in the development of ellipsometers. With a total of 2 patents, his work has advanced the capabilities of measuring optical properties of materials.

Latest Patents

Wielsch's latest patents include an innovative ellipsometer designed for the examination of samples. This ellipsometer features a broadband light source on the emitter side and a detector on the receiver side for capturing the reflected light beam from the sample. It incorporates a refractive optic to generate a precisely defined measuring spot on the sample, along with an aperture on the emitter side to further refine this spot. His second patent focuses on a method for determining characteristic values of transparent layers in the nanometer range, such as layer thickness and refractive index. This method allows for the measurement of these values using a less complex ellipsometer that operates at one or a few wavelengths.

Career Highlights

Throughout his career, Uwe Wielsch has worked with prominent companies in the optical technology sector, including Sentech Instruments GmbH and Jenoptik Optical Systems GmbH. His expertise in ellipsometry has positioned him as a key figure in the development of advanced optical measurement solutions.

Collaborations

Wielsch has collaborated with notable professionals in his field, including Uwe Richter and Helmut Witek. These collaborations have contributed to the advancement of technology in optical measurements.

Conclusion

Uwe Wielsch's contributions to the field of spectroscopic ellipsometry have established him as a significant inventor in optical measurement technology. His innovative patents and collaborations reflect his commitment to advancing the capabilities of optical instruments.