Wendelstein, Germany

Uwe Hauf


 

Average Co-Inventor Count = 3.7

ph-index = 3

Forward Citations = 11(Granted Patents)


Location History:

  • State College, PA (US) (2004)
  • Wendelstein, DE (2006 - 2013)

Company Filing History:


Years Active: 2004-2013

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4 patents (USPTO):Explore Patents

Title: Uwe Hauf: Innovator in Plating Treatment Systems

Introduction

Uwe Hauf is a notable inventor based in Wendelstein, Germany. He has made significant contributions to the field of plating treatment systems, holding a total of 4 patents. His innovative designs focus on enhancing the efficiency and effectiveness of workpiece treatment processes.

Latest Patents

Hauf's latest patents include a vertical system for the plating treatment of a workpiece and a treatment unit for the wet-chemical or electrolytic treatment of flat workpieces. The vertical system comprises at least two treatment modules with retaining devices for workpieces and a transport device featuring gripping devices that securely hold the workpieces. This design allows for precise clamping and releasing of the workpieces, ensuring optimal treatment. The treatment unit is designed for the transportation of flat workpieces, such as metal foils and printed circuit boards, utilizing a module system that integrates seamlessly with carrier elements.

Career Highlights

Uwe Hauf has established himself as a key figure in the industry through his work at Atotech Deutschland GmbH. His innovative approaches have led to advancements in plating treatment technologies, making significant impacts on manufacturing processes.

Collaborations

Hauf has collaborated with notable coworkers, including Henry Kunze and Ferdinand Wiener, contributing to the development of cutting-edge technologies in the field.

Conclusion

Uwe Hauf's contributions to plating treatment systems exemplify his commitment to innovation and excellence in engineering. His patents reflect a deep understanding of the complexities involved in workpiece treatment, positioning him as a leader in his field.

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