Uwe Griesinger

Title: Uwe Griesinger: Innovator in Photolithography

Introduction

Uwe Griesinger is a notable inventor based in Anzing, Germany. He has made significant contributions to the field of photolithography, holding a total of 5 patents. His work focuses on enhancing the precision and effectiveness of photomasks used in semiconductor manufacturing.

Latest Patents

Griesinger's latest patents include innovative methods for producing structures and exposing wafers in projection apparatuses. One of his key inventions involves the use of auxiliary openings assigned to openings on a mask. These auxiliary openings possess a phase-shifting property, which enhances the contrast of the aerial image on the wafer. This method allows for the production of elliptical structures from square openings on the mask, significantly improving the quality of the printed images.

Career Highlights

Throughout his career, Uwe Griesinger has worked with prominent companies in the technology sector. He has been associated with Infineon Technologies AG and Siemens Aktiengesellschaft, where he contributed to advancements in semiconductor technology. His expertise in photolithography has positioned him as a valuable asset in these organizations.

Collaborations

Griesinger has collaborated with notable colleagues, including Rainer Pforr and Christoph Friedrich. These partnerships have fostered innovation and the development of cutting-edge technologies in the field.

Conclusion

Uwe Griesinger's contributions to photolithography and semiconductor manufacturing are noteworthy. His innovative patents and collaborations have significantly impacted the industry, showcasing his expertise and dedication to advancing technology.