The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 2004
Filed:
Jul. 19, 2002
Uwe Griesinger, Anzing, DE;
Infineon Technologies AG, Munich, DE;
Abstract
The present invention provides a method for producing a photomask ( ), which has the following steps: provision of a mask blank with a substrate ( ) and a masking layer ( ) applied thereto; whole-area resist-coating of the mask blank with a photoresist; performance of a raster scan exposure of the photoresist in accordance with a predetermined photomask pattern in a pattern region (MB), which is separated from an edge ( ) of the mask blank by a peripheral edge region (RB); performance of the raster scan exposure in at least one peripheral partial region of the edge region (RB), which adjoins the edge ( ) on one side; development of the exposed photoresist; etching of the masking layer ( ); and removal of the photoresist. The present invention also provides a corresponding photomask.