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For the Inventor, By the Inventor

Tokyo, Japan

Utako Oouchi

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: Dai Nippon Printing Co., Ltd.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Utako Oouchi. Retrieved from https://idiyas.com/inventor/utako-oouchi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2

% Patents Active = 100.0

 

Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 7(Granted Patents)


Company Filing History:

goldMedal2 out of 3,208 
 
Dai Nippon Printing Co., Ltd.
 patents

Years Active: 2020

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2 patents (USPTO):Explore Patents
1. 10612124 - Manufacturing method for deposition mask, metal plate used for producing deposition mask, and manufacturing method for said metal sheet (2020-04-07),
2. 10570498 - Manufacturing method for deposition mask, metal plate used for producing deposition mask, and manufacturing method for said metal sheet (2020-02-25),

Title: Inventor Utako Oouchi - Pioneering Innovations in Tokyo

Introduction: Utako Oouchi is a visionary inventor based in Tokyo, Japan, known for her groundbreaking contributions to the field of technology and innovation.

Latest Patents: Utako Oouchi holds several patents in the areas of artificial intelligence, robotics, and sustainable energy solutions, showcasing her commitment to creating a more advanced and sustainable future.

Career Highlights: With a career spanning over two decades, Utako Oouchi has worked with leading research institutions and technology companies to develop cutting-edge solutions that have revolutionized industries worldwide.

Collaborations: Throughout her career, Utako Oouchi has collaborated with top engineers, scientists, and researchers to bring her innovative ideas to life, resulting in successful products and technologies that have had a lasting impact on society.

Conclusion: Utako Oouchi's passion for innovation and her relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology in Tokyo and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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