Rüschlikon, Switzerland

Urs T Duerig

This inventor holds 82 USPTO granted patents and 3 published patent applications, plus 2 CIPO patents and 2 EPO patents, primarily in Data Storage Technology (CPC class G11B9-149). Top assignees: International Business Machines Corporation, Swisslitho Ag, Globalfoundries Inc.. Active years: 1989-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Urs T Duerig. Retrieved from https://idiyas.com/inventor/urs-t-duerig

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 82 

% Patents Active = 31.7

 

 

Average Co-Inventor Count = 4.6

ph-index = 10

Forward Citations = 367(Granted Patents)

Forward Citations (Not Self Cited) = 322(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Rueschliken, CH (2010)
  • Ruschlikon, CH (1989 - 2011)
  • Rueschlikon, CN (2011)
  • Zurich, CH (2013 - 2017)
  • Switzerland, CH (2018)
  • Rueschlikon, CH (2001 - 2020)

Company Filing History:


Years Active: 1989-2020

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Areas of Expertise:
Data Storage Medium
Electromechanical Switching
Microfluidic Processing
High Density Storage
Scanning Probe Microscopy
Thermo-Optical Lithography
Nano-Object Positioning
Curved Surface Defects
2D Layered Materials
Thermal Scanning Probe
Patterning Nano-Scale
Atomic-Force Microscope
82 patents (USPTO):Explore Patents

Title: **Urs T. Duerig: A Pioneer in Electromechanical Innovations**

Introduction

Urs T. Duerig, located in Rueschlikon, Switzerland, is a prominent inventor recognized for his substantial contribution to the field of electromechanical devices. With an impressive portfolio of 81 patents, Duerig has made significant strides in the realm of technology through his innovative ideas and solutions.

Latest Patents

Duerig's latest inventions showcase his expertise in advanced materials and device design. One notable patent is his **electromechanical switching device with electrodes having 2D layered materials with distinct functional areas**. This device features a first electrode made from a first 2D layered material and a second electrode from a second 2D layered material, both exhibiting anisotropic electrical conductivity. The innovation lies in the actuation mechanism that modifies electrical conductance, enabling efficient current modulation between the electrodes.

Another significant patent is the **fabrication of a micro-optics device with curved surface defects**. This method involves creating a curved surface by locally unzipping and desorbing molecules from a layer of material. The technique allows the production of a micro-optics device with a defined layer structure and intricate surface profiles, emphasizing Duerig's focus on precision and cutting-edge materials in optical applications.

Career Highlights

Throughout his career, Urs T. Duerig has had impactful experiences with renowned organizations. Notably, he worked with **IBM**, a global leader in technology and consulting, where he honed his skills in research and development. He also contributed his expertise at **Swisslitho AG**, focusing on innovative solutions in the lithography and microfabrication sectors. His diverse experiences have enriched his perspective on technological advancements and market needs.

Collaborations

Duerig has collaborated with several esteemed professionals during his career, including **Armin W. Knoll** and **Bernd W. Gotsmann**. These collaborations have led to significant innovations and advancements in their respective fields, further solidifying Duerig's status as a credible figure in the research community.

Conclusion

Urs T. Duerig's contributions to innovation in electromechanical devices and micro-optics are commendable. With a remarkable number of patents and a history of working with leading companies, he continues to influence the technological landscape. Duerig's visionary work serves as an inspiration for aspiring inventors and researchers striving to push the boundaries of what is possible in the realm of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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