Uri Lev

Title: Innovations of Uri Lev

Introduction

Uri Lev is an accomplished inventor based in Mazkeret Batya, Israel. He has made significant contributions to the field of charged particle beam technology, holding two patents that showcase his innovative approach to scanning and imaging.

Latest Patents

Uri Lev's latest patents include a "System and method for scanning an object with an electron beam using overlapping scans and electron beam counter-deflection." This invention involves a charged particle beam system that utilizes optics and a movable stage to scan multiple areas of an object, ensuring that each point is scanned multiple times with overlapping areas. The method compensates for movement through counter-movement deflections of the charged particle beam. Another notable patent is "Imaging of crystalline defects," which describes a method for detecting crystal defects by scanning samples with a charged particle beam at various tilt angles. This process allows for the identification of areas with lower signals, indicating potential defects.

Career Highlights

Uri Lev is currently employed at Applied Materials Israel Limited, where he continues to develop and refine technologies related to charged particle beams. His work has contributed to advancements in imaging and defect detection, making a significant impact in the field.

Collaborations

Uri collaborates with talented colleagues, including Dror Shemesh and Benjamin Colombeau, who contribute to the innovative environment at Applied Materials Israel Limited.

Conclusion

Uri Lev's contributions to the field of charged particle beam technology through his patents and work at Applied Materials Israel Limited highlight his role as a leading inventor. His innovative methods for scanning and imaging continue to advance the understanding and application of this technology.