Jena, Germany

Ulrike Schulz

USPTO Granted Patents = 12 

 

Average Co-Inventor Count = 4.2

ph-index = 4

Forward Citations = 40(Granted Patents)


Location History:

  • Kunitz, DE (2003)
  • Jena, DE (2011 - 2020)

Company Filing History:


Years Active: 2003-2020

Loading Chart...
Loading Chart...
12 patents (USPTO):Explore Patents

Title: Ulrike Schulz: Innovator in Optical Technologies

Introduction

Ulrike Schulz is a prominent inventor based in Jena, Germany. She has made significant contributions to the field of optical technologies, holding a total of 12 patents. Her innovative work focuses on methods and materials that enhance optical performance.

Latest Patents

One of her latest patents is a method for producing a reflection-reducing layer system. This method involves depositing an organic layer on a substrate, generating a nanostructure in the organic layer through a plasma etching process, and applying a cover layer to the nanostructure. The resulting structure effectively reduces reflection, with the cover layer being at least 5 nm thick. Another notable patent is for an optical element that includes a substrate with a silicone surface and an antireflection layer. This layer comprises a first organic layer with a reflection-reducing nanostructure and a cover layer that does not exceed 40 nm in thickness.

Career Highlights

Ulrike has worked with esteemed organizations such as the Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. and Friedrich-Schiller-Universität Jena. Her experience in these institutions has allowed her to develop and refine her innovative ideas in optical technologies.

Collaborations

Ulrike has collaborated with notable colleagues, including Peter Munzert and Norbert Kaiser. These partnerships have contributed to her success and the advancement of her research.

Conclusion

Ulrike Schulz is a trailblazer in the field of optical technologies, with a strong portfolio of patents that reflect her innovative spirit. Her work continues to influence advancements in optical materials and methods.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…