The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 2019
Filed:
Apr. 22, 2015
Applicant:
Fraunhofer-gesellschaft Zur Förderung Der Angewandten Forschung E.v., Munich, DE;
Inventors:
Ulrike Schulz, Jena, DE;
Friedrich Rickelt, Jena, DE;
Peter Munzert, Jena, DE;
Norbert Kaiser, Jena, DE;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/3065 (2006.01); H01L 21/3213 (2006.01); G02B 1/111 (2015.01); G02B 1/18 (2015.01); G02B 1/12 (2006.01); G02B 1/118 (2015.01);
U.S. Cl.
CPC ...
G02B 1/111 (2013.01); G02B 1/118 (2013.01); G02B 1/12 (2013.01); G02B 1/18 (2015.01); H01J 37/32366 (2013.01); H01L 21/3065 (2013.01); H01L 21/32136 (2013.01);
Abstract
A method for producing an antireflection layer on a silicone surface is described. The method includes application of an organic layer, production of a nanostructure in the organic layer by a plasma etching process, and application of at least one cover layer onto the nanostructure. An optical element can be produced by the method.