Company Filing History:
Years Active: 2009-2011
Title: Ulrich Andiel: Innovator in EUV Lithography
Introduction
Ulrich Andiel is a notable inventor based in Ulm, Germany, recognized for his contributions to the field of EUV lithography. With a total of 2 patents, he has made significant advancements in optical elements used for reflecting radiation in the extreme ultraviolet wavelength range.
Latest Patents
Andiel's latest patents include a method for removing reflective layers from EUV mirrors. This innovative method involves etching away at least one reflective layer from an optical element, which consists of a substrate and an interlayer. The etching process utilizes an etching gas that does not react with the interlayer material, ensuring that the surface roughness of the interlayer remains below 0.5 nm rms, with preferred values of less than 0.2 nm rms and even less than 0.1 nm rms. Additionally, he has developed methods for testing and manufacturing optical elements with non-rotationally symmetric shapes, utilizing interferometer optics to generate measuring light and detect interference patterns.
Career Highlights
Throughout his career, Ulrich Andiel has worked with prominent companies such as Carl Zeiss SMT GmbH and Carl Zeiss SMT AG. His expertise in optical technologies has positioned him as a key figure in the development of advanced lithography techniques.
Collaborations
Andiel has collaborated with notable colleagues, including Martin Weiser and Olaf Bork, contributing to the advancement of optical technologies in the industry.
Conclusion
Ulrich Andiel's innovative work in EUV lithography and optical elements has made a significant impact on the field. His patents and collaborations reflect his dedication to advancing technology in this critical area.