Dresden, Germany

Udo Götschkes

This inventor holds 1 USPTO granted patent. Top assignee: Infineon Technologies Ag. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Udo Götschkes. Retrieved from https://idiyas.com/inventor/udo-götschkes

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: Udo Götschkes: Innovator in Wafer Mark Configuration

Introduction

Udo Götschkes is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of lithography, particularly in the production of DRAMs. His innovative work focuses on improving the alignment and determination of relative positions in substrates during lithographic exposure.

Latest Patents

Udo Götschkes holds a patent for a mark configuration, wafer with at least one mark configuration, and a method of producing at least one mark configuration. This invention allows for a mark configuration that includes a mark structure and at least one layer of definable thickness underneath the mark structure. This design is crucial for adjusting the physical position of the mark structure relative to a reference plane in or on the substrate. The invention ensures that mark structures exhibit good contrast regardless of design or process conditions.

Career Highlights

Udo Götschkes is associated with Infineon Technologies AG, where he has been instrumental in advancing technologies related to wafer production. His expertise in lithography and mark configurations has positioned him as a key player in the semiconductor industry.

Collaborations

Udo has collaborated with notable colleagues such as Frank Hübinger and Gerd Krause. Their combined efforts have contributed to the development of innovative solutions in the field of semiconductor manufacturing.

Conclusion

Udo Götschkes is a distinguished inventor whose work in wafer mark configurations has significantly impacted the semiconductor industry. His innovative approaches continue to enhance the efficiency and effectiveness of lithographic processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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