Company Filing History:
Years Active: 1987-1992
Title: Udo Bringmann: Innovator in Chemical Vapor Deposition Technologies
Introduction
Udo Bringmann is a notable inventor based in Halstenbek, Germany. He has made significant contributions to the field of chemical vapor deposition (CVD) technologies, holding a total of five patents. His work focuses on processes that enhance the deposition of materials, particularly in semiconductor and materials science applications.
Latest Patents
Among his latest patents is a process for depositing a layer containing boron and nitrogen. This innovative method involves decomposing one or more N-substituted borazoles in the presence of a substrate, specifically utilizing a plasma CVD process. Another significant patent is a method of depositing micro-crystalline solid particles by hot filament. This technique allows for the deposition of solid particles from a vapor phase containing a carbonaceous gas, using chemical vapor deposition at controlled pressures and temperatures.
Career Highlights
Udo Bringmann has worked with prominent companies such as U.S. Philips Corporation and Solvay Deutschland GmbH. His experience in these organizations has contributed to his expertise in the development of advanced deposition techniques.
Collaborations
Throughout his career, Udo has collaborated with notable professionals in the field, including Detlef G. Schon and Claus-Peter Klages. These collaborations have further enriched his work and innovations.
Conclusion
Udo Bringmann's contributions to the field of chemical vapor deposition are noteworthy, with several patents that reflect his innovative spirit and technical expertise. His work continues to influence advancements in material science and semiconductor technologies.