Company Filing History:
Years Active: 2024
Title: Tzujen Lin: Innovator in Semiconductor Technology
Introduction
Tzujen Lin is a prominent inventor based in Anhui, China. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent.
Latest Patents
Tzujen Lin holds a patent for a "Method and apparatus for making shallow trench structure." This patent addresses the challenges associated with traditional lateral etching technology that can damage silicon in shallow trenches. The method involves preparing a substrate, forming material layers, and performing both wet and dry etching processes to create a shallow trench structure effectively.
Career Highlights
Tzujen Lin is associated with Nexchip Semiconductor Corporation, where he applies his expertise in semiconductor manufacturing. His work focuses on improving the efficiency and reliability of semiconductor devices.
Collaborations
Tzujen Lin has collaborated with notable colleagues, including Chihchiang Yang and Chengwei Lin, to advance semiconductor technologies and innovations.
Conclusion
Tzujen Lin's contributions to semiconductor technology through his innovative patent demonstrate his commitment to enhancing manufacturing processes in the industry. His work continues to influence the field positively.