Company Filing History:
Years Active: 2006-2008
Title: Tzuen-Luh Huang: Innovator in Semiconductor Technology
Introduction
Tzuen-Luh Huang is a notable inventor based in Portland, OR (US). He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on methods and apparatuses that enhance the performance and reliability of electronic components.
Latest Patents
Huang's latest patents include a method for constructing contact formations. This invention involves placing a substrate in an electrolytic solution that contains metallic ions and an accelerator. By applying a voltage, metallic particles are deposited on the conductive portion of the substrate. Additionally, he has developed an under bump metallization layer that enables the use of high tin content solder bumps. This invention includes a multi-layer structure designed to prevent tin migration, which can lead to delamination and damage to underlying structures.
Career Highlights
Tzuen-Luh Huang is currently employed at Intel Corporation, where he continues to innovate in semiconductor technologies. His work has been instrumental in advancing the reliability and efficiency of electronic devices.
Collaborations
Huang has collaborated with several talented individuals, including Ming Fang and Kevin J Lee. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.
Conclusion
Tzuen-Luh Huang's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His work continues to impact the field positively, paving the way for future innovations.