This inventor holds 1 USPTO granted patent. Top assignee: Semiconductor Manufacturing International (Beijing) Corporation. Active years: 2015.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2015
Title: **Innovative Contributions of Tzu Hsuan Lu in Photolithography**
Introduction
Tzu Hsuan Lu, based in Beijing, China, is a notable inventor recognized for his contributions in the field of semiconductor technology. With a focus on innovation, he has developed a significant patent that enhances the precision and effectiveness of photolithography processes used in semiconductor manufacturing.
Latest Patents
Tzu Hsuan Lu holds a patent for a "Photolithography alignment mark, mask and semiconductor wafer containing the same mark." This invention introduces an innovative alignment mark composed of a plurality of first alignment lines arranged in a first direction and a plurality of second alignment lines in a second direction that is perpendicular to the first. Each first alignment line consists of a specified number of uniformly spaced fine alignment lines, which enhances alignment accuracy. The design allows for the placement of alignment marks in non-circuit pattern regions of the mask and across multiple layers on the semiconductor wafer, showcasing significant advancements in photolithography technology.
Career Highlights
Currently, Tzu Hsuan Lu is employed at Semiconductor Manufacturing International Corporation (SMIC), where he applies his expertise to push the boundaries of semiconductor technology. His work is instrumental in advancing manufacturing capabilities, ensuring higher precision in the production of semiconductor devices.
Collaborations
Throughout his career, Tzu Hsuan Lu has collaborated with esteemed colleagues such as Xiaosong Yang and Yibo Yan. These partnerships not only enhance innovation but also contribute to a collaborative environment that fosters the development of cutting-edge technology in the semiconductor field.
Conclusion
Tzu Hsuan Lu's contributions to the field of photolithography reflect a dedicated pursuit of innovation within semiconductor manufacturing. His patent serves as a testament to his expertise and commitment to enhancing the industry's technological landscape. As advancements continue to evolve, Tzu Hsuan Lu remains a key figure in driving forward the future of semiconductor technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile