Hsinchu, Taiwan

Tzu-Hsuan Dai

This inventor holds 1 USPTO granted patent. Top assignee: Tera Xtal Technology Corporation. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tzu-Hsuan Dai. Retrieved from https://idiyas.com/inventor/tzu-hsuan-dai

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Tzu-Hsuan Dai: Innovator in Pad Conditioning Technology

Introduction

Tzu-Hsuan Dai is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of pad conditioning technology, showcasing his innovative spirit and technical expertise. His work has led to the development of a unique patent that enhances the efficiency of polishing processes.

Latest Patents

Tzu-Hsuan Dai holds a patent for a "Pad Conditioning Tool." This innovative tool includes a sapphire chip with a side surface that defines a polishing surface. The polishing surface features a plurality of sapphire grains that are formed in an integral manner. Each of these grains possesses a three-dimensional geometric structure, arranged in a specific pattern to optimize performance.

Career Highlights

Dai is currently associated with Tera Xtal Technology Corporation, where he continues to push the boundaries of technology. His work at the company reflects his commitment to advancing the field of semiconductor manufacturing and polishing techniques.

Collaborations

Some of Tzu-Hsuan Dai's coworkers include Jun-Wen Chung and Wen-Yen Shen. Their collaborative efforts contribute to the innovative environment at Tera Xtal Technology Corporation.

Conclusion

Tzu-Hsuan Dai's contributions to pad conditioning technology exemplify his role as a leading inventor in the industry. His patent and ongoing work at Tera Xtal Technology Corporation highlight his dedication to innovation and excellence.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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