Ilan, Taiwan

Tzu En Ho


Average Co-Inventor Count = 3.8

ph-index = 2

Forward Citations = 7(Granted Patents)


Location History:

  • Ilan Hsien, TW (2004)
  • Ilan, TW (2004)

Company Filing History:


Years Active: 2004

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3 patents (USPTO):Explore Patents

Title: Tzu En Ho: Innovator in Semiconductor Manufacturing

Introduction

Tzu En Ho is a prominent inventor based in Ilan, Taiwan, known for his contributions to semiconductor manufacturing. With a total of 3 patents, he has made significant advancements in the field, particularly in shallow trench isolation techniques.

Latest Patents

One of Tzu En Ho's latest patents is a manufacturing method for a shallow trench isolation region with a high aspect ratio. This innovative method involves providing a substrate with a trench, forming a first insulation layer using high density plasma chemical vapor deposition (HDPCVD), and subsequently removing the majority of this layer outside the trench through spray type etching. The process concludes with the formation of a second insulation layer via low pressure CVD to fill the trench, ensuring a void-free shallow trench isolation with a high aspect ratio.

Another notable patent is the method for shallow trench isolation fabrication and partial oxide layer removal. This method entails forming a first oxide layer conformally over a semiconductor substrate and a trench with an aspect ratio greater than 3. A liquid etching shield is then filled in the trench by spin-spraying, followed by spraying an etchant over the substrate to remove the uncovered oxide layer. This innovative approach allows for the deposition of a second oxide layer in the trench, achieving isolation without voids or seams.

Career Highlights

Tzu En Ho is currently employed at Nan Ya Technology Corporation, where he continues to develop cutting-edge technologies in semiconductor manufacturing. His work has significantly impacted the efficiency and effectiveness of shallow trench isolation processes.

Collaborations

Throughout his career, Tzu En Ho has collaborated with notable colleagues, including Chang Rong Wu and Hsin-Jung Ho, contributing to various advancements in their field.

Conclusion

Tzu En Ho's innovative methods in semiconductor manufacturing highlight his expertise and commitment to advancing technology. His contributions continue to shape the industry and pave the way for future developments.

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