Hsin-Pu, Taiwan

Tzing-Huei Shiau


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Tzing-Huei Shiau: Innovator in Charge Pump Technology

Introduction

Tzing-Huei Shiau is a notable inventor based in Hsin-Pu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of charge pump circuits. His innovative work has led to the filing of a patent that showcases his expertise and creativity in this area.

Latest Patents

One of Tzing-Huei Shiau's key patents is titled "Low threshold MOS two phase negative charge pump." This invention describes a triple well charge pump that includes a first transistor configured in a diode arrangement. The first channel terminal is connected to a first node, while the second channel terminal is linked to its gate and a second node. The design incorporates capacitors and clock signals that enhance the efficiency of the charge pump. The patent highlights the unique characteristics of the transistors and their operational thresholds, which are crucial for the functionality of the device. Tzing-Huei Shiau holds 1 patent related to this innovative technology.

Career Highlights

Tzing-Huei Shiau is currently employed at Macronix International Co., Ltd., where he continues to advance his research and development efforts. His work at Macronix has positioned him as a key player in the semiconductor industry, contributing to the company's reputation for innovation and quality.

Collaborations

Throughout his career, Tzing-Huei Shiau has collaborated with talented individuals such as Yu-Shen Lin and Ray-Lin Wan. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Tzing-Huei Shiau's contributions to charge pump technology exemplify his innovative spirit and dedication to advancing semiconductor solutions. His patent and collaborations reflect his commitment to excellence in the field.

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