Tze Haw Liew

Title: Tze Haw Liew: Innovator in Nanostructure Technology

Introduction

Tze Haw Liew is a notable inventor based in Singapore, recognized for his contributions to nanotechnology. He holds a patent for a method of forming a discrete nanostructured element on a substrate, showcasing his expertise in this cutting-edge field.

Latest Patents

Liew's patent, titled "Method of forming a nanostructure," presents a novel approach to creating nanostructured elements at predetermined locations on a substrate. The method involves forming a mask member over the substrate, creating windows to expose portions of the substrate, and removing material to form recesses. A layer of nanostructure medium is then applied, followed by annealing to produce the nanostructured element, which has dimensions of less than 100 nm in at least two orthogonal directions. This innovation highlights the potential for advancements in nanotechnology applications.

Career Highlights

Throughout his career, Tze Haw Liew has worked with prominent organizations, including Globalfoundries Singapore Pte. Ltd. and the National University of Singapore. His experience in these institutions has contributed significantly to his development as an inventor and researcher in the field of nanotechnology.

Collaborations

Liew has collaborated with notable colleagues such as Han Guan Chew and Fei Zheng, further enhancing his work and contributions to the field.

Conclusion

Tze Haw Liew's innovative approach to nanostructure technology and his patent demonstrate his significant role in advancing this field. His work continues to inspire future developments in nanotechnology.