Tz-Jin Yang

Title: Innovations of Tz-Jin Yang in Photoresist Removal

Introduction

Tz-Jin Yang is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of materials science, particularly in the development of methods for removing photoresist. His innovative approach has implications for various applications in electronics and manufacturing.

Latest Patents

Tz-Jin Yang holds a patent for a method of removing photoresist, which includes a laminate, a method of forming a metallic pattern, a polyimide resin, and a stripper. This method involves forming a release layer on a substrate, where the release layer has a first surface and a second surface opposite to each other. The first surface of the release layer is in contact with the substrate, while a photoresist layer is formed on the second surface. The process concludes with the removal of both the release layer and the photoresist layer. The release layer is created using a polyimide resin, which is synthesized through the polymerization of tetracarboxylic dianhydrides, diamines, and phenolamines.

Career Highlights

Tz-Jin Yang is currently employed at Echem Solutions Corp., where he continues to advance his research and development efforts. His work has been instrumental in enhancing the efficiency and effectiveness of photoresist removal processes, which are critical in the semiconductor industry.

Collaborations

Some of Tz-Jin Yang's coworkers include Yung-Yu Lin and Chi-Yu Lai. Their collaborative efforts contribute to the innovative environment at Echem Solutions Corp., fostering advancements in material science and engineering.

Conclusion

Tz-Jin Yang's contributions to the field of photoresist removal demonstrate his innovative spirit and commitment to advancing technology. His patent reflects a significant step forward in materials science, with potential applications in various industries.