Company Filing History:
Years Active: 1997-1999
Title: Innovations of Tutomu Tamaki in Semiconductor Technology
Introduction
Tutomu Tamaki is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on methods for manufacturing semiconductor devices that enhance performance and efficiency.
Latest Patents
Tamaki's latest patents include a method for manufacturing a semiconductor device with adjustable features. This method involves creating N-type source and drain regions that are formed substantially in parallel to each other on a P-type semiconductor substrate. The design includes a channel region with first to fourth edges sandwiched between the source and drain regions. A gate insulating film is applied to the substrate, with gate electrodes formed in parallel to the source and drain regions. The innovation allows for precise control over the impurity concentration in the diffusion region, enhancing the device's functionality.
Another significant patent by Tamaki is for a semiconductor device with an adjustable channel width. Similar to his previous work, this device features N-type source and drain regions on a P-type substrate. The design includes a gate insulating film and gate electrodes that cross the source and drain regions. This invention also emphasizes the importance of self-alignment during the ion implantation process, ensuring optimal performance of the semiconductor device.
Career Highlights
Tutomu Tamaki is currently employed at Kabushiki Kaisha Toshiba, where he continues to innovate in semiconductor technology. His expertise and dedication to research have positioned him as a key figure in the industry.
Collaborations
Tamaki collaborates with Kiyomi Naruke, contributing to advancements in semiconductor research and development.
Conclusion
Tutomu Tamaki's contributions to semiconductor technology through his innovative patents demonstrate his commitment to enhancing device performance. His work continues to influence the field and pave the way for future advancements.