Columbia, MO, United States of America

Tushar K Ghos

This inventor holds 1 USPTO granted patent. Top assignee: University of Missouri. Active years: 2013.


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Innovations of Tushar K Ghos in Wide Band Gap Materials

Introduction

Tushar K Ghos is an accomplished inventor based in Columbia, MO (US). He has made significant contributions to the field of materials science, particularly in the development of wide band gap materials. His innovative work has led to the creation of a patented method that enhances the functionality of these materials.

Latest Patents

Tushar K Ghos holds a patent for "Systems and methods for co-doping wide band gap materials." This patent describes a method of simultaneously co-doping a wide band gap material with both p-type and n-type impurities to create a p-n junction within the resulting composite material. The method involves placing a sample containing a dopant with both types of impurities between two wide band gap material films. The sample is subjected to a preselected vacuum, heated to a specific temperature, and a voltage is applied across it. Additionally, a laser beam with predetermined intensity and wavelength is used to facilitate the diffusion of the impurities into the wide band gap material films, resulting in a compound material with a p-n junction.

Career Highlights

Tushar K Ghos is affiliated with the University of Missouri, where he continues to advance research in materials science. His work has garnered attention for its potential applications in various technological fields, including electronics and optoelectronics.

Collaborations

He has collaborated with notable colleagues such as Mark A Prelas and Robert V Tompson, Jr. These partnerships have contributed to the depth and breadth of his research endeavors.

Conclusion

Tushar K Ghos is a prominent figure in the field of materials science, with a focus on wide band gap materials. His innovative patent demonstrates his commitment to advancing technology through scientific research. His contributions are paving the way for future developments in this critical area.

Profile summary based on public USPTO records.
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