Tun-Wen Pi

Title: The Innovations of Tun-Wen Pi

Introduction

Tun-Wen Pi is a notable inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches to manufacturing methods and materials.

Latest Patents

One of his latest patents is titled "Semiconductor device and manufacturing method thereof." This method involves forming a semiconductive channel layer on a substrate, creating a dummy gate, and subsequently forming gate spacers on either side of the dummy gate. The process includes removing the dummy gate to create a gate trench, which exposes the semiconductive channel layer. A semiconductive protection layer is then deposited in the gate trench, followed by oxidizing the top portion of this layer to form an oxidation layer. After annealing the oxidation layer, a gate structure is formed over the semiconductive protection layer and within the gate trench.

Another significant patent by Tun-Wen Pi is related to using molecular beam epitaxy in a semiconductor structure with a high K/GaSb interface. This patent discloses a wafer comprising a first layer of GaSb grown on a GaSb substrate by molecular beam epitaxy. The process includes capping the wafer with an arsenic layer after the growth of the first layer and subsequently removing the arsenic layer before depositing an oxide layer on the surface of the first layer.

Career Highlights

Tun-Wen Pi has worked with prominent organizations such as Taiwan Semiconductor Manufacturing Company Ltd. and National Taiwan University. His experience in these institutions has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Throughout his career, Tun-Wen Pi has collaborated with talented individuals, including Juei-Nai Kwo and Jui-Lin Chu, who have contributed to his research and development efforts.

Conclusion

Tun-Wen Pi's innovative work in semiconductor technology has led to significant advancements in the field. His patents reflect a deep understanding of manufacturing processes and materials, positioning him as a key figure in the industry.