This inventor holds 4 USPTO granted patents and 2 published patent applications. Top assignee: Tokyo Electron Limited. Active years: 2025-2026.
Company Filing History:
Years Active: 2025-2026
Title: Innovations of Tulashi Dahal in Wet Atomic Layer Etching
Introduction
Tulashi Dahal is an accomplished inventor based in Austin, TX (US). He has made significant contributions to the field of materials science, particularly in the area of atomic layer etching. His innovative methods have the potential to enhance the efficiency and effectiveness of etching processes in various applications.
Latest Patents
Tulashi Dahal holds a patent titled "Methods for wet atomic layer etching of molybdenum." This patent describes systems and methods for etching molybdenum using a wet atomic layer etching (ALE) process. The techniques outlined in the patent utilize various wet etch chemistries to oxidize the molybdenum surface, forming a self-limiting molybdenum oxide passivation layer. This layer is crucial for achieving controlled etching of the molybdenum surface. The methods include ultra-violet (UV) photolysis of peroxide oxidizers, steric hindrance of large reactant molecules, and ligand-assisted oxidation to ensure effective self-limiting oxidation behavior.
Career Highlights
Tulashi Dahal is currently employed at Tokyo Electron Limited, where he continues to develop and refine his innovative techniques. His work has garnered attention for its potential applications in semiconductor manufacturing and other high-tech industries. With a focus on advancing etching processes, Dahal's contributions are paving the way for more efficient manufacturing techniques.
Collaborations
Tulashi has collaborated with notable colleagues, including Paul Abel and Mengistie Debasu. These collaborations have fostered a dynamic environment for innovation and have contributed to the development of cutting-edge technologies in the field.
Conclusion
Tulashi Dahal's work in wet atomic layer etching represents a significant advancement in materials science. His innovative methods and dedication to research are shaping the future of etching processes in various industries.